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Frequently Asked Questions

Other process fabrication applications for the Optitherm III include wafer rotation and speed, wafer alignment (out of position), and process fault operating conditions.

The Optitherm III has an unmatched wafer temperature measurement accuracy to ±3°C for temperature control.

The Optitherm III has a data acquisition rate to 1ms and can output 70 readings per second to the host PC.

The Optitherm III infrared thermometer is used for precise temperature measurement during in-situ epitaxial growth in semiconductor applications.

The temperature range for the Optitherm III is 250°C – 1500°C.

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