EH-20-10 Electron Source
Description
This electron source delivers a high power density beam into a small spot, for applications including evaporation, X-ray generation, thermal shocks, annealing, and detector testing.
EH-20-10 Electron Source
Specifications |
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|---|---|
| Energy Range: | 1000-20000eV |
| Max Beam Current: | 500 uA |
| Min Beam Size: | 150 um |
Features
- Working distance 150 mm – 750 mm
- Basic beam blanking (optional)
- Beam blanking, external (optional)
- Beam pulsing (optional)
- Differential pumping (DP) (optional)
- Advanced beam steering (patented)
- Parallel beam shift (optional)
- Computer control (optional)
- Magnetic shielding (optional)
- Beam scanning (optional)
- Microprocessor controlled beam current regulation (optional)
- Remote control
Applications
- Electron beam treatment
- Detector testing
- Evaporation
- Annealing
- Desorption
- Dissociation
- Ionization of gases
- Cathodoluminescence
- X-ray emission analyses
- X-ray generation
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
Contact Supplier
How to order?
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Ships from:
Germany
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Sold by:
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On FindLight:
External Vendor
Claim Staib Instruments Inc Page to edit and add data
Frequently Asked Questions
Yes, the EH-20-10 Electron Source can be computer controlled as an optional feature.
The EH-20-10 Electron Source can be used for electron beam treatment, detector testing, evaporation, annealing, desorption, dissociation, ionization of gases, cathodoluminescence, X-ray emission analyses, and X-ray generation.
The EH-20-10 Electron Source is used for applications including evaporation, X-ray generation, thermal shocks, annealing, and detector testing.
The working distance of the EH-20-10 Electron Source is 150 mm – 750 mm.
Optional features for the EH-20-10 Electron Source include basic beam blanking, external beam blanking, beam pulsing, differential pumping, advanced beam steering, parallel beam shift, computer control, magnetic shielding, beam scanning, and microprocessor controlled beam current regulation.