Two-Photon Grayscale Lithography Microfabrication

Quantum X Two-Photon Grayscale Lithography

Nanoscribe GmbH

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The brand-new Nanoscribe Quantum X system is designed for the microfabrication of prototypes and masters in industrial production processes. This maskless lithography system redefines the fabrication of free-form microoptics, microlens arrays and multi-level diffractive optical elements. The world’s first Two-Photon Grayscale ...

Specifications
Printing Technology:	Grayscale Lithography, Two-Photon Grayscale Lithography
Min XY Feature Size:	160 nm
Min Vertical Step:	10 nm
Min Surface Roughness:	10 nm
Area Printing Speed:	3 mm^2/h

Data Sheet

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Two-Photon Grayscale Lithography Microfabrication

Specifications