Laser Scribed Graphene for Industrial Applications

Laser Scribed Graphene (LSG)

Laser Scribed Graphene (LSG)

Sold by: Alfa Chemistry Ships from: United States
Specifications
Size: 1 cm^2
Molar Mass: 12 g/mol
Molecular Weight: 12.011 g/mol
Boiling Point: Very high (USCG, 1999); Sublimes (NIOSH, 2016); 4200 °C; Sublimes at 3642 °C; Triple point (graphite-liquid-gas), 4492 °C at a pressure of 101.325 kPa; >4000 °C
Appearance: Black film

Did You Know?

Laser-scribed graphene (LSG) is typically formed by photothermal reduction of polymer or oxide precursors using UV to mid-IR lasers, and can reach sheet resistances on the order of 10–30 Ω/sq at room temperature without any metal coating, provided the laser fluence and scan overlap are tightly controlled. Unlike CVD graphene, LSG is intrinsically 3D and porous, which dramatically increases its effective surface area (often >100 m²/g) and makes it highly attractive for supercapacitor electrodes and electrochemical sensors. A common misconception is that higher laser power always improves conductivity; in practice, excessive fluence can over-ablates carbon, disrupt percolation pathways, and increase resistance, so optimal power density and pulse duration are critical process parameters.

Frequently Asked Questions

Laser scribed graphene (LSG) is a porous, foam-like graphene network formed directly on a carbon-rich precursor (typically polyimide, lignin, or other polymers) by localized laser-induced pyrolysis. A focused laser beam converts the surface into few-layer, turbostratic graphene with high surface area and conductivity, without the need for wet chemistry or transfer steps.

Engineered Laser Scribed Graphene Materials

Laser Scribed Graphene is a porous, conductive carbon network produced by direct laser writing on polymeric or carbon-rich substrates. Localized laser heating converts the precursor surface into few-layer graphene with high surface area, tunable porosity, and patterned geometries. On FindLight, Laser Scribed Graphene products are offered as structured films, patterned electrodes, and functional surfaces for sensing, energy, and microelectronic applications.

Typical Specifications and Parameters

When evaluating Laser Scribed Graphene, engineers typically compare:

  • Substrate material: Polyimide (PI), polycarbonate (PC), or other carbon-rich polymers affecting mechanical flexibility and thermal stability.
  • Laser parameters: Wavelength (commonly 355–1064 nm), pulse duration (ns–fs), fluence, and scan speed, which control sheet resistance, porosity, and pattern resolution.
  • Electrical properties: Sheet resistance (Ω/sq), carrier mobility, and conductivity stability over thermal cycling or humidity exposure.
  • Structural properties: Layer count (few-layer vs. turbostratic), pore size distribution, surface roughness (Ra), and thickness per pass.
  • Pattern features: Line width, pitch, registration accuracy, minimum feature size, and total active area of Laser Scribed Graphene patterns.
  • Chemical functionality: Oxygen-containing groups, heteroatom doping (N, S, B), and surface treatment options for enhanced wettability or specific binding.

Use Cases and Application Domains

Laser Scribed Graphene is used for electrochemical and gas sensors, micro-supercapacitor electrodes, flexible and stretchable interconnects, transparent or semi-transparent heaters, and wettability-controlled surfaces. Its direct-write patterning makes Laser Scribed Graphene attractive for rapid prototyping of flexible electronics, lab-on-chip devices, and low-cost IoT sensor nodes.

Buyer Guidance on FindLight

On FindLight, you can compare Laser Scribed Graphene solutions by substrate type, sheet resistance, pattern density, and available processing window. Review datasheets for detailed laser scribing conditions, environmental stability data, and integration guidelines with adhesives, encapsulants, or printed traces. For non-standard geometries or custom functionalization of Laser Scribed Graphene, contact suppliers directly from the product page to request quotes or discuss process adaptation. No registration is required to initiate technical inquiries, obtain pricing, or evaluate lead times for your next development or production run.