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Pulsed Laser Deposition (PLD) Thin Film Deposition

AIX 2800G4-TM IC2 DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS
AIXTRON SE
AIX 2800G4-TM for GaAs/InP based Optoelectronics and p-HEMT/HBT Devices.

Specifications

Substrate Size: 203.2-152.4mm
Base Vacuum: -- Torr
Max Substrate Temperature: -- degC
Process Type: Pulsed Laser Deposition (PLD)
Data Sheet
HEX Modular Deposition Systems
Korvus Technology Ltd
The HEX series is a compact and highly flexible range  of deposition systems which allow the user complete freedom to reconfigure the equipment to suit their current experimental needs or for a future change of direction. The system can be purchased at the most basic level and later upgraded to a ...

Specifications

Substrate Size: 0.5-6mm
Base Vacuum: 300 Torr
Max Substrate Temperature: 500 degC
Process Type: Pulsed Laser Deposition (PLD)
Data Sheet
Pioneer 120 Advanced PLD System
Neocera Inc
Pioneer 120 Advanced PLD System is a stand-alone system for preparing high quality epitaxial films, multi-layer heterostructures and superlattices of a variety of materials. The primary difference between this PLD system and the Pioneer 120 PLD System is the substrate heating stage. Pioneer 120 uses a conductive heating stage where ...

Specifications

Substrate Size: 10-50.8mm
Base Vacuum: 5 x 10-9 Torr
Max Substrate Temperature: 850 degC
Process Type: Pulsed Laser Deposition (PLD)
Data Sheet
Pioneer 120 PLD System
Neocera Inc
Pioneer 120 PLD System is the most basic PLD System. This is a stand-alone PLD system for preparing high quality epitaxial films, multi-layer heterostructures, superlattices etc. The primary difference between this PLD system and the Pioneer 120 Advanced and Pioneer 180 PLD Systems is the substrate heating stage. Pioneer 120 uses a ...

Specifications

Substrate Size: 25.4-50.8mm
Base Vacuum: 5 x 10-7 Torr
Max Substrate Temperature: 950 degC
Process Type: Pulsed Laser Deposition (PLD)
Data Sheet
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