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LARGE AREA UV EXPOSURE SYSTEMS
Bachur & Associates
B&A offers a variety of high performance, collimated UV Lightsources and UV Flood Exposure Systems. These systems are used for fine line patterning as well as the enhancement of many UV photolithography processes employed by the Microelectronics Industry.  These UV systems are designed for production use as well as R&D ...
  • Spectral Range: 220 - 450 nm
  • Max Beam Dimension: 450 mm
Data Sheet