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Pulsed Electron Deposition (PED) Thin Film Deposition

Pioneer 180 PED System
Neocera Inc
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Pioneer 180 PED System
In Pulsed Electron Deposition (PED), a pulsed (80-100 ns) high power electron beam (approximately 1000 A, 15 keV) penetrates approximately 1 μm into the target resulting in a rapid evaporation of target material. The non-equilibrium heating of the target facilitates stoichiometric ablation of the target material. Under optimum ...

Specifications
Substrate Size: 10-50.8mm
Base Vacuum: 5 x 10-7 Torr
Max Substrate Temperature: 850 degC
Process Type: Pulsed Electron Deposition (PED)
Data Sheet
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