LARGE AREA UV EXPOSURE SYSTEMS
Description
B&A offers a variety of high performance, collimated UV Lightsources and UV Flood Exposure Systems. These systems are used for fine line patterning as well as the enhancement of many UV photolithography processes employed by the Microelectronics Industry. These UV systems are designed for production use as well as R&D applications. Near, Mid, and Deep UV systems are available with a variety of standard and optional features including beam sizes to 18" (450mm), intensity controlling powersupplies, and up to 5,000W capability. The system's UV optics employ a proven, high performance optic train that include an elliptical reflector, dielectric heat removing primary and secondary mirrors, a multi-element optical integrator system and collimating optics. The system's optical integrator system produces uniformity and non-coherent radiation that virtually eliminates the detrimental effects of diffraction. These high intensity systems can resolve fine structures even in thick photosensitive materials.
LARGE AREA UV EXPOSURE SYSTEMS
Specifications |
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| Spectral Range: | 220-450nm |
| Max Beam Dimension: | 450 mm |
Features
Uniform, Lightsource Systems
Near, Mid and Deep UV Versions
200W to 5,000W Systems
Intensity Controlling Powersupply Systems
Shutter Controller
Hi-Rel, Low Maintenance Design
Excellent Documentation
Applications
Photoresist Patterning
Photoresist Stabilization
Edge Bead Exposure
Photoresist Modification
Image Reversal
Polymer Research
PCM Processes
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
Contact Supplier
How to order?
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Ships from:
United States
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Sold by:
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On FindLight:
External Vendor
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Frequently Asked Questions
The available beam sizes range from 100mm to 450mm for Near UV systems and 100mm to 200mm for Deep UV systems.
The beam divergence for Near UV systems is 2.6 deg. to < 1.2 deg., and for Deep UV systems is 2.6 deg. to < 2.3 deg.
The beam uniformity for standard systems is +/- 5% for diameters and +/- 6% for squares. For high uniformity systems, it is +/- 2.5% for diameters and +/- 3.5% for squares.
The beam spectrum for the UV systems ranges from 340nm to 450nm for Near UV systems and 220nm to 260nm for Deep UV systems.
The intensity at 1,000W is 30mW/cm2 (UV365) and 60 mW/cm2 (UV400) for Near UV systems, and ~8 mW/cm2 (DUV220) and ~12 mW/cm2 (DUV260) for Deep UV systems.