CSUPREM Process Simulation Software
Description
CSUPREM (Crosslight-SUPREM) is a process simulation software package based on the SUPREM.IV.GS code developed at the Integrated Circuits Laboratory of Stanford University. SUPREM.IV.GS (2D) has long been recognized as the industry standard in process simulation for integrated circuit (IC) design for over a decade. Crosslight greatly enhances the capability of the original code from Stanford and extends it from 2D to 3D. Please refer to our full and mini CSUPREM product brochures for more details…
CSUPREM Process Simulation Software
Features
Reliable and flexible next-generation 2D/3D process simulator
2D, Quasi-3D, Hybrid-3D and Full 3D process simulation
2D and Full 3D device simulation when combined with APSYS
GPU-accelerated solver
Full 3D diffusion models
Highly effiicient mesh allocation based on stacked and bended mesh planes
Greatly reduced mesh count and faster computation time
Gauss, Pearson, SIMS data and user-defined models
Auto or user-controlled switch between four different etching models
Strained silicon, SiC and GaN-based material systems
Activation models for all dopants
Optimize devices using AutoTCAD and Design of Experiments (DOE)
Batch processing
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Canada
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Frequently Asked Questions
CSUPREM is a process simulation software package for MEMS and IC devices.
CSUPREM can be used for process simulation in integrated circuit (IC) design and MEMS devices.
CSUPREM offers reliable and flexible 2D/3D process simulation, device simulation, diffusion models, etching models, material systems, and activation models for dopants.
Yes, CSUPREM can optimize devices using AutoTCAD and Design of Experiments (DOE).
Yes, CSUPREM supports batch processing.