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Frequently Asked Questions

Yes, the 6cm RF ion beam source is designed around the flexibility of internal mounting and is also capable of being mounted directly to a flange for process flexibility.

The body of the 6cm RF ion beam source is not water-cooled, thus requiring only two feedthroughs, RF power and DC Bias/Gas.

The 6cm RF ion beam source is ideal for research and smaller production systems, as well as etch and ion beam figuring (IBF) systems with its highly divergent or highly convergent grid options.

The maximum beam current of the 6cm RF ion beam source is 200mA at 1500V.

As with all RF sources, the 6cm RF ion beam source can be run with both inert and reactive gases, making it ideal for any ion beam process.

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