FIB FOCUSED ION BEAM

Spellman’s FIB Series is an integrated multiple output high voltage power supply specifically designed for focused ion beam applications. It incorporates a high stability accelerator voltage with the floating outputs to drive traditional Ga Ion and Plasma Sources. An additional Lens Chassis is available, providing the high performance fixed or reversible polarity high voltage lenses required to focus the Ion Beam. Both the Main Chassis and Lens Chassis are 19” rack mountable. Focused Ion Beam is typically used in the semiconductor industry, materials science and increasingly in the biological field for imaging, etching and deposition of materials. The Main Chassis provides an Acceleration voltage up to 35kV, with floating Filament, Extractor and Suppressor outputs, all designed to the exacting performance requirements for FIB applications. The Lens Chassis offers Lens voltages up to 30kV, with fixed or Reversible polarity. All outputs are offered with ultra-low output ripple, excellent regulation, stability, temperature coefficient, drift and accuracy specifications. Isolation and control of the respective floating sources is provided via Spellman’s proprietary high voltage isolation techniques. Customer control of this integrated FIB power supply system is accomplished via a fiber optic interface. All high voltage safety interlocks are of a failsafe hardware based design. The FIB is CE marked and is designed to be compliant with applicable IEC, UL and SEMI standards. Consult factory for final configuration requirements.