Description
RHEED guns from STAIB Instruments provide unique electron optics systems for diffraction studies. Important options include differential pumping (DP) for use in high pressures and beam rocking to expand the sample positions that can be monitored. Short (S) or super short (SS) housings can be selected for confined spaces.
Specifications |
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|---|---|
| Energy Range: | 500-15000eV |
| Max Beam Current: | 30 uA |
| Min Beam Size: | 100 um |
Features
- Working distance 50 mm – 500 mm
- Differential pumping (DP) (optional)
- Beam rocking (optional)
- Basic beam blanking
- Beam blanking, external (optional)
- Advanced beam steering (patented)
- Parallel beam shift (optional)
- Computer control (optional)
- Remote control
- Microprocessor controlled beam current regulation (optional)
- Magnetic shielding (optional)
Applications
- In situ Characterization
- Molecular Beam Epitaxy (MBE)
- Oxide Molecular Beam Epitaxy (Oxide MBE)
- Pulsed Laser Deposition (PLD)
- Laser Molecular Beam Epitaxy (Laser MBE)
- Ion Beam Assisted Deposition (IBAD)
- Sputter deposition
- Atomic Layer Deposition (ALD)
- Metalorganic Chemical Vapor Deposition (MOCVD)
- Combinatorial approaches
- Reflection Electron Energy Loss Spectroscopy (REELS)
- Cathodoluminescence
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
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How to order?
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Ships from:
Germany
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Sold by:
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On FindLight:
External Vendor
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Frequently Asked Questions
Yes, computer control is an optional feature for the RHEED-15.
The RHEED-15 is suitable for a range of applications including in situ characterization, molecular beam epitaxy (MBE), oxide molecular beam epitaxy (Oxide MBE), pulsed laser deposition (PLD), laser molecular beam epitaxy (Laser MBE), ion beam assisted deposition (IBAD), sputter deposition, atomic layer deposition (ALD), metalorganic chemical vapor deposition (MOCVD), combinatorial approaches, reflection electron energy loss spectroscopy (REELS), and cathodoluminescence.
The important options available for the RHEED-15 include differential pumping (DP) for use in high pressures and beam rocking to expand the sample positions that can be monitored.
The magnetic shielding option for the RHEED-15 is intended to protect the electron beam from external magnetic fields.
The working distance range of the RHEED-15 is 50 mm – 500 mm.