EF-1202 Electron Gun Column
Description
This electron gun column is designed to generate a very small spot in the nm range. It is also available as part of a complete scanning electron imaging package (SEM-package).
EF-1202 Electron Gun Column
Specifications |
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|---|---|
| Energy Range: | 200-12000eV |
| Max Beam Current: | 2 uA |
| Min Beam Size: | 0.25 um |
Features
- Working Distance (WD) 10 mm – 50 mm
- Optimum WD 12 mm nominal
- Basic beam blanking (optional)
- Beam blanking, external (optional)
- Beam pulsing (optional)
- Computer control (optional)
- Magnetic shielding (optional)
- Beam scanning (optional)
- Microprocessor controlled beam current regulation (optional)
- Remote control
Applications
- AES- Depth profiling
- Absorbent current EM (electron microscope)
- Elastically scattered EM (electron microscope)
- UHV Scanning Electron Microscopy (SEM)
- Scanning Auger Microscopy (SAM)
- Auger Electron Spectroscopy (AES)
- Electron Energy Loss Spectroscopy (EELS) / Reflection Energy Energy Loss Spectroscopy (REELS)
- Sample imaging
- Electron Backscattered Diffraction (EBSD)
- X-ray emission analyses
- MicroRHEED
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
Contact Supplier
How to order?
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Ships from:
Germany
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Sold by:
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On FindLight:
External Vendor
Claim Staib Instruments Inc Page to edit and add data
Frequently Asked Questions
The EF-1202 Electron Gun Column can be microprocessor controlled as an optional feature.
Some of the applications of the EF-1202 Electron Gun Column include AES-depth profiling, absorbent current EM (electron microscope), elastically scattered EM (electron microscope), UHV Scanning Electron Microscopy (SEM), Scanning Auger Microscopy (SAM), Auger Electron Spectroscopy (AES), Electron Energy Loss Spectroscopy (EELS) / Reflection Energy Energy Loss Spectroscopy (REELS), Sample imaging, Electron Backscattered Diffraction (EBSD), and X-ray emission analyses.
The optional features available with the EF-1202 Electron Gun Column include basic beam blanking, external beam blanking, beam pulsing, computer control, magnetic shielding, beam scanning, and microprocessor controlled beam current regulation.
The EF-1202 Electron Gun Column is used for generating a very small spot in the nm range and is also available as part of a complete scanning electron imaging package (SEM-package).
The working distance range of the EF-1202 Electron Gun Column is 10 mm – 50 mm, with an optimum WD of 12 mm nominal.