EpiCurve TT Curvature Measurement System
Description
To overcome the challenges that occur with larger wafers (4", 6" or 8"), you need the advanced EpiCurve® TT system. It combines wafer curvature measurements with all the features of the EpiTT:emissivity-corrected pyrometry and growth rate/thickness measurements by three-wavelength reflectance. This tool will help you avoid cracks, achieve flat wafers and control temperature homogeneity. Every curvature tool can be equipped with Advanced Resolution (AR) curvature measurements for wafer bow a sphericity control (EpiCurve®TT AR).
EpiCurve TT Curvature Measurement System
Specifications |
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|---|---|
| Index Measurement Range: | 3-20 |
| Accuracy: | -1-1 |
| Repeatability: | 1-1 |
Features
- Wafer-selective curvature measurements in the curvature range from -7000 km-1 (convex) to +800 km-1 (concave)
- Versions with a blue laser provide measurements on double-sided polished and patterned substrates
- Aspherical bowing curvature measurements with an Advanced Resolution (AR) option
Applications
- GaN LED and laser diode production
- III-Nitride growth on silicon
- GaAs/AlGaInP/InP laser diode production
- Triple-junction solar cell production on GaAs, Ge, Si
- SiC for power electronics
- R&D for new materials and devices
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
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How to order?
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Ships from:
Germany
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Frequently Asked Questions
The EpiCurve TT Curvature Measurement System is used to measure wafer curvature, control temperature homogeneity, and achieve flat wafers in various applications such as LED and laser diode production, solar cell production, and R&D for new materials and devices.
The features of the EpiCurve TT Curvature Measurement System include wafer-selective curvature measurements, versions with a blue laser for measurements on double-sided polished and patterned substrates, aspherical bowing curvature measurements with an Advanced Resolution (AR) option, and wafer-selective reflectance measurements at three wavelengths.
The curvature range of the EpiCurve TT Curvature Measurement System is from -7000 km-1 (convex) to +800 km-1 (concave).
The temperature range of the EpiCurve TT Curvature Measurement System is T=450 °C to ~ 1300 °C for large viewport systems and T=500 °C to ~ 1400 °C for narrow viewport systems.
The typical accuracy of the curvature measurements with the EpiCurve TT Curvature Measurement System is ± 3 km-1, and with the Advanced Resolution (AR) option, it is ± 0.5 km-1 (asphericity: ± 0.3 km-1).