Multiwavelength Laser Ellipsometers LSE-WS
Description
Multiwavelength Laser Ellipsometers give the user greater versatility in thickness and refractive index measurement of thin transparent and semi-transparent films. Laser light sources have ample light intensity for increased measurement accuracy of absorbing and rough scattering films. Laser sources have the added advantage of being spectrally precise, stable and long lasting. Their use permits optimum instrument design with optics, detectors and other components so that measurements can be made highly accurate. Separate laser sources offer backup reliability important to continuous operation and they are a excellent alternative to overly complicated less precise spectroscopic ellipsometers.
Multiwavelength Laser Ellipsometers LSE-WS
Specifications |
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|---|---|
| Spectral Range: | 405-830nm |
| Spectral Resolution: | -- nm |
| Angle Of Incidence: | 1-1deg |
Features
- Measure thick films without thickness period ambiguity
- Variable wavelength useful for difficult to measure films.
- Get refractive index in near period regions
- Trouble-free, no moving parts advance StokesMeter™ measurement head.
- Measures complete state of polarization useful for rough, scattering samples.
- Measure photoresist index closer to exposure wavelengths
- Get dispersion with two or three values of refractive index
- Analyze difficult to measure films like Poly, Plasma Nitride and Silicon on Sapphire
- Improves modeling results using more measured data for complicated structures
- Simpler and less complex than spectroscopic ellipsometers.
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
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Frequently Asked Questions
Multiwavelength Laser Ellipsometers are used for thickness and refractive index measurement of thin transparent and semi-transparent films.
Laser light sources provide ample light intensity for increased measurement accuracy of absorbing and rough scattering films. They are also spectrally precise, stable, and long-lasting.
Yes, these ellipsometers can measure thick films without thickness period ambiguity.
Yes, these ellipsometers are suitable for measuring difficult-to-measure films. The variable wavelength feature makes them useful for such films.
Yes, these ellipsometers can analyze difficult-to-measure films like Poly, Plasma Nitride, and Silicon on Sapphire.