femt-O-cut Nanoprocessing With Femtosecond Near Infrared Laser Pulses
Description
The system femt-O-cut® uses compact femtosecond NIR lasers for 3-dimensional nanoprocessing in transparent materials. Low energy (sub-nanojoule to nanojoule) pulses at high repetition rates of up to 90 MHz are focused by high numerical aperture (NA 1.3) optics for optical breakdown in sub-femtoliter volumes. The beam intensity is regulated by a motorized attenuator. Several TW/cm² can be reached in the focal region to enable ultraprecise ablation with a minimum cut size below 70 nm (FWHM) by multiphoton ionization.
The device is based on a conventional microscope which is equipped with a high-speed galvoscanning unit. Fullframe scans, region-of-interest (ROI) scans, line scans as well as single point ablation (spot scan, drilling) can be performed with submicron accuracy. A motorized stage is used for large area processing. For vertical positioning the focusing optics are mounted on a piezo-driven stage with an accuracy of 40 nm. femt-O-cut® also represents a diagnostic tool for noninvasive tomography. This allows for the observation of the samples by high-resolution imaging to select the target area as well as to monitor the result of the ablation procedure.
femt-O-cut Nanoprocessing With Femtosecond Near Infrared Laser Pulses
Specifications |
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|---|---|
| Scan Range (X): | 350 um |
| Scan Range (Y): | 350 um |
| Scan Range (Z): | 200 um |
| Spatial Resolution (lateral): | 1 um |
| Spatial Resolution (vertical): | 2 um |
Applications
Ultrashort pulsed lasers have been demonstrated to be a powerful tool for nanostructuring in semiconductors, metals, dielectrics, polymers, and tissues. Because of the strong linear absorption in most materials, UV-laser based systems provide only surface patterning. In contrast, femt-O-cut® offers real three-dimensional processing even in depths of more than 100 µm with submicron cut width. By multiphoton ionisation in the focal region, cut sizes below the diffraction limit can be achieved. The system can be used for direct writing of nanoscale structures in NIR-transparent materials and opens a wide field of industrial and medical as well as scientific applications. Nanoscale structuring by femtosecond laser pulses is used for waveguide writing, photomask fabrication and to improve the surface quality of certain components. Further, drilling of microscopic holes into a variety of materials is possible. The interaction of ultrashort pulsed lasers with biological materials has been found to be strongly limited to the focal volume minimising the harm to nearby tissue regions. It is therefore possible to disconnect mutant tissue from living cells. The high resolution of femt-O-cut® enables knocking-out of single organelles without any visible deleterious effect. With its extremely localised working area femt-O-cut® has the potential to be a powerful tool for DNA manipulation. It can be used for optical deactivation of certain genomic regions in chromosomes. Femtosecond laser pulses have been shown to be applicable for sectioning of human chromosomes and for highly localised gene and molecule transfer.
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Frequently Asked Questions
The system can be used for direct writing of nanoscale structures in NIR-transparent materials and opens a wide field of industrial and medical as well as scientific applications.
femt-O-cut® is a system that uses compact femtosecond NIR lasers for 3-dimensional nanoprocessing in transparent materials.
The minimum cut size that can be achieved by femt-O-cut® is below 70 nm (FWHM) by multiphoton ionization.
Ultrashort pulsed lasers have been demonstrated to be a powerful tool for nanostructuring in semiconductors, metals, dielectrics, polymers, and tissues.
Fullframe scans, region-of-interest (ROI) scans, line scans as well as single point ablation (spot scan, drilling) can be performed with submicron accuracy.