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The EQ-10HR is a compact, easy-to-use, reliable, and cost-effective EUV light source based on Energetiq’s proven Electrodeless Z-Pinch™ technology using Xenon gas. The EQ-10HR high repetition rate EUV source is uniquely suited for metrology and research applications where simulation of high volume ...
  • Central Wavelength: 13.5 nm
  • Spectral Bandwidth: 0.27 nm
  • EUV Output Power (2pi Steradian): 20 W
  • Pulse Repetition Rate: 1000 - 10000 Hz
Data Sheet
The EQ-10HP is a compact, easy-to-use, reliable, and cost-effective EUV light source based on Energetiq’s proven Electrodeless Z-Pinch™ technology using Xenon gas. The EQ-10HP EUV source is uniquely suited for metrology and research applications. The EQ-10 series sources have become the workhorse EUV ...
  • Central Wavelength: -- nm
  • Spectral Bandwidth: -- nm
  • EUV Output Power (2pi Steradian): 20 W
  • Pulse Repetition Rate: 1200 - 2500 Hz
Data Sheet
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective light source, based on Energetiq’s proven Electrodeless Z-Pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications. The EQ-10 has become the workhorse EUV source for the EUV community, through its proven ...
  • Central Wavelength: 13.5 nm
  • Spectral Bandwidth: .27 nm
  • EUV Output Power (2pi Steradian): 10 W
  • Pulse Repetition Rate: 1200 - 2000 Hz
Data Sheet

Did You know?

Plasma, considered the fourth state of matter, is a hot ionized medium consisting of roughly equal amounts of positively and negatively charged particles. As plasma is highly influenced by magnetic and electric fields, plasma light sources utilize the properties of plasma to produce extremely high-power light. One of the main applications of plasma light sources is for extreme ultraviolet (EUV) photolithography for semiconductor chip manufacturing. Because EUV uses a greatly reduced wavelength, it enables smaller and more precise features on silicon surface wafers than optical lithography.