Model 2000SM Edge-Bead UV Flood Exposure System
Description
The OAI 2000SM Edge-bead Exposure System provides a cost-effective method for edge-bead exposure using standard shadow mask technology. Mask and substrate changeover can be accomplished quickly and easily adding to the versatility as well as throughput of this high volume production tool. The Model 2000 includes a UV lightsource, intensity controlling power supply, and robotic substrate handling subsystem. UV lightsources provide uniform intensity beams with divergence half-angles of <2.0º. Power supplies are available from 200W to 5,000W. Intensity controller sensors are linked directly to the lightsource for accurate intensity monitoring. The OAI robotic substrate handling system is microprocessor controlled and may be programmed to accommodate a wide variety of substrate sizes. The shadow mask capability enables the user to pattern the top-side of a substrate while being held in very close proximity to the mask. At a separation of 25 microns, these systems are capable of 6 micron resolution.
Model 2000SM Edge-Bead UV Flood Exposure System
Specifications |
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| Emission Spectral Range: | 190-405nm |
| Application: | Industrial, Research and Development, Wafer UV Flood Exposure |
Features
Throughput is independent of pattern complexity.
Entire substrate is exposed at one time.
Intensity-controlling power supply.
Changing the exposure pattern is as simple as changing the shadow mask.
Changeover (including mask alignment) requires only ten minutes.
Applications
For pricing, technical or any other questions please contact the supplier
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- No markups, no fees
- Direct contact with supplier
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United States
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Frequently Asked Questions
In terms of simplicity, versatility, ease of operation and overall cost of ownership, the OAI Edge-bead and Flood Exposure Systems are by far the best solution available.
The Model 2000 can be used for wafer UV flood exposure, photoresist stabilization and modification, image reversal and PCM processes.
The Model 2000 includes a UV lightsource, intensity controlling power supply, and robotic substrate handling subsystem.
The OAI 2000SM Edge-bead Exposure System is a cost-effective method for edge-bead exposure using standard shadow mask technology.
At a separation of 25 microns, these systems are capable of 6 micron resolution.