Model 2000AF UV Flood Exposure System
Description
The OAI 2000SM Edge-bead Exposure System provides a cost-effective method for edge-bead exposure using standard shadow mask technology. Mask and substrate changeover can be accomplished quickly and easily adding to the versatility as well as throughput of this high volume production tool. The Model 2000 includes a UV lightsource, intensity controlling power supply, and robotic substrate handling subsystem. UV lightsources provide uniform intensity beams with divergence half-angles of <2.0º. Power supplies are available from 200W to 5,000W. Intensity controller sensors are linked directly to the lightsource for accurate intensity monitoring. The OAI robotic substrate handling system is microprocessor controlled and may be programmed to accommodate a wide variety of substrate sizes. The shadow mask capability enables the user to pattern the top-side of a substrate while being held in very close proximity to the mask. At a separation of 25 microns, these systems are capable of 6 micron resolution.
Model 2000AF UV Flood Exposure System
Specifications |
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| Emission Spectral Range: | 190-405nm |
| Application: | Wafer UV Flood Exposure |
Features
Throughput is independent of pattern complexity.
Entire substrate is exposed at one time.
Intensity-controlling power supply.
Changing the exposure pattern is as simple as changing the shadow mask.
Changeover (including mask alignment) requires only ten minutes.
Applications
For pricing, technical or any other questions please contact the supplier
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- No markups, no fees
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United States
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Frequently Asked Questions
Changing the exposure pattern in the OAI Model 2000SM Edge-bead System is as simple as changing the shadow mask and requires only ten minutes for changeover, including mask alignment.
The OAI Model 2000AF UV Flood Exposure System can be used for wafer flood exposure, photoresist stabilization and modification, image reversal, and PCM processes.
The OAI Edge-bead and Flood Exposure Systems are the best solution available in terms of simplicity, versatility, ease of operation, and overall cost of ownership.
The OAI Model 2000AF UV Flood Exposure System is a high volume production tool that includes a UV lightsource, intensity controlling power supply, and robotic substrate handling subsystem.
At a separation of 25 microns, the OAI Model 2000AF UV Flood Exposure System is capable of 6 micron resolution.