Incoherent Light Sources
Charged Particle Sources
Optics Manufacturing
Optical Systems
Opto-Mechanics
Engineering Services
Spectral Analysis
Imaging and Vision
Metrology and Inspection
- Home
- Charged Particle Sources
- Electron Sources
- Microfocus and Nanofocus Systems
- EF-1201 Electron Gun Column
EF-1201 Electron Gun Column
OVERVIEW
This electron gun column is designed to generate a very small spot in the nm range. It is also available as part of a complete scanning electron imaging package (SEM-package).
SPECIFICATION
- Energy Range: 200 - 12 eV
- Max Beam Current: 2 uA
- Min Beam Size: 0.15 um
Applications
- AES- Depth profiling
- Absorbent current EM (electron microscope)
- Elastically scattered EM (electron microscope)
- UHV Scanning Electron Microscopy (SEM)
- Scanning Auger Microscopy (SAM)
- Auger Electron Spectroscopy (AES)
- Electron Energy Loss Spectroscopy (EELS) / Reflection Energy Energy Loss Spectroscopy (REELS)
- Sample imaging
- Electron Backscattered Diffraction (EBSD)
- X-ray emission analyses
KEY FEATURES
- Working Distance (WD) 10 mm – 50 mm
- Optimum WD 12 mm nominal
- Basic beam blanking (optional)
- Beam blanking, external (optional)
- Beam pulsing (optional)
- Computer control (optional)
- Magnetic shielding (optional)
- Beam scanning (optional)
- Microprocessor controlled beam current regulation (optional)
- Remote control
Staib Instruments Inc
Are you Staib Instruments Inc representative? Claim This Page Today!

No one from Staib Instruments Inc has updated the information yet
Claim Staib Instruments Inc Page to edit and add data
Claim Staib Instruments Inc Page to edit and add data
Claim Staib Instruments Inc page on FindLight
Update your vendor page, upload more products, receive sales leads and bring world-wide exposure to Staib Instruments Inc
You may also like
Sign in
OR
Don’t have an account?
Please consider registering
NOTE: It may take up to 10 min to receive the registration verification link. For immediate assistance please use the “GUEST” option above.