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- EF-1201 Electron Gun Column
EF-1201 Electron Gun Column
OVERVIEW
This electron gun column is designed to generate a very small spot in the nm range. It is also available as part of a complete scanning electron imaging package (SEM-package).
SPECIFICATION
- Energy Range: 200 - 12 eV
- Max Beam Current: 2 uA
- Min Beam Size: 0.15 um
Applications
- AES- Depth profiling
- Absorbent current EM (electron microscope)
- Elastically scattered EM (electron microscope)
- UHV Scanning Electron Microscopy (SEM)
- Scanning Auger Microscopy (SAM)
- Auger Electron Spectroscopy (AES)
- Electron Energy Loss Spectroscopy (EELS) / Reflection Energy Energy Loss Spectroscopy (REELS)
- Sample imaging
- Electron Backscattered Diffraction (EBSD)
- X-ray emission analyses
KEY FEATURES
- Working Distance (WD) 10 mm – 50 mm
- Optimum WD 12 mm nominal
- Basic beam blanking (optional)
- Beam blanking, external (optional)
- Beam pulsing (optional)
- Computer control (optional)
- Magnetic shielding (optional)
- Beam scanning (optional)
- Microprocessor controlled beam current regulation (optional)
- Remote control
Staib Instruments Inc
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